| |
 |
|
|
|
|
| Octafluorocyclobutane, C4F8
» |
|
|
OCTAFLUOROCYCLOBUTANE
(C4F8, RC318, Halocarbon 318C)
|
| Name: |
Octafluorocyclobutane |
|
| Symbol: |
C4F8 |
| CAS ID: |
115-25-3 |
| UN Number: |
UN 1976 |
Octafluorocyclobutane C4F8
used for plasma etching of some recently developed processes of
silicon compounds.
Qualitative performance
OCTAFLUOROCYCLOBUTANE (C4F8,
RC318, Halocarbon 318C)
|
| Parameter |
Measure in |
Detection limit |
Critical value |
Octafluorocyclobutane
in liquid phase, min. |
|
% vol. |
99,999 |
| Nitrogen |
vppm |
0,05 |
8,0 |
| Oxygen |
vppm |
0,05 |
2,0 |
| Tetrafluoromethane (CF4) |
vppm |
0,5 |
1,0 |
| Moisture |
wppm |
0,01 |
3,0 |
| Acidity as HF |
wppm |
0,01 |
0,1 |
Information about cylinders
| Type of a cylinder |
Bulk, litreses |
Type of a valvees |
Net weightes, kg |
| B40 |
40 |
DIN 477/6 |
28 |
| B50 |
50 |
DIN 477/6 |
32 |
Transport data
| Chemical Symbol: |
C4F8 |
| CAS Registry ID: |
115-25-3 |
| Physical properties: |
A colorless, non-toxic, non-flammable gas |
| Hazard Class: |
2.2 |
| UN Number: |
UN 1976 |
|
|
| Xenon, Xe » |
| Krypton, Kr » |
| Neon, Ne » |
| Helium, He » |
| Argon, Ar » |
| Lasergas, XeNe » |
| Lasergas, KrNe » |
| Lasergas, ArXeNe » |
| Lasergas, NeH2 » |
| Tetrafluoromethane,
CF4 » |
| Sulfur Hexafluoride,
SF6 » |
| Silicon tetrafluoride,
SiF4 » |
| Octafluoropropane,
C3F8 » |
 |
|
|
|
|
