Tetrafluoromethane CF4 »
TETRAFLUOROMETHANE 4 (R14 ) Gas Purity 99,999.
Name:
Tetrafluoromethane
Symbol:
CF4
Molecular Weight:
88,01 g/mol
CAS Registry ID:
75-73-0
UN Number:
UN 1982
CF4 mainly used for plasma etching
in various silicon films processes. Can be used alone or in combination
with oxygen. Lower grades of CF4 are also available.
Qualitative performance
Halocarbon 14 CF4 % 99,999
Nitrogen
N2
ppm
8,0
Oxygen
O2
ppm
2,0
Halocarbon 116
C2 F6
ppm
1,0
Carbon oxides
CO+CO2
ppm
0,5
Sulfur hexafluoride
SF6
ppm
0,5
Moisture
H2 O
ppm
1,0
Acidity as HF
wppm
0,1
Information about cylinders
Type of a cylinder
Bulk, litreses
Type of a valvees
Operating pressurees, bar
Net weightes, kg
B40
40
DIN 477/6
22
42
B50
50
DIN 477/6
22
50
Transport data
Chemical Symbol:
CF4
CAS Registry ID:
75-73-0
Physical properties:
A colorless, non-toxic, non-flammable gas
Hazard Class:
2.2
UN Number:
UN 1982
Xenon, Xe »
Krypton, Kr »
Neon, Ne »
Helium, He »
Argon, Ar »
Octafluoropropane,
C3 F8 »
Octafluorocyclobutane,
C4 F8 »
Sulfur Hexafluoride,
SF6 »
Silicon tetrafluoride,
SiF4 »
Propen(Propylen),
C3 H6 »
Propan, C3 H8
»
Butan »
Lasergases »
