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Tetrafluoromethane CF4»
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TETRAFLUOROMETHANE
CF4 (R14 ) Gas Purity 99,999. |
Name: |
Tetrafluoromethane |
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Symbol: |
CF4 |
Molecular Weight: |
88,01 g/mol |
CAS Registry ID: |
75-73-0 |
UN Number: |
UN 1982 |
CF4 mainly used for plasma etching
in various silicon films processes. Can be used alone or in combination
with oxygen. Lower grades of CF4 are also available.
Qualitative performance
Halocarbon 14 |
CF4 |
% |
99,999 |
Nitrogen |
N2 |
ppm |
8,0 |
Oxygen |
O2 |
ppm |
2,0 |
Halocarbon 116 |
C2F6 |
ppm |
1,0 |
Carbon oxides |
CO+CO2 |
ppm |
0,5 |
Sulfur hexafluoride |
SF6 |
ppm |
0,5 |
Moisture |
H2O |
ppm |
1,0 |
Acidity as HF |
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wppm |
0,1 |
Information about cylinders
Type of a cylinder |
Bulk, litreses |
Type of a valvees |
Operating pressurees, bar |
Net weightes, kg |
B40 |
40 |
DIN 477/6 |
22 |
42 |
B50 |
50 |
DIN 477/6 |
22 |
50 |
Transport data
Chemical Symbol: |
CF4 |
CAS Registry ID: |
75-73-0 |
Physical properties: |
A colorless, non-toxic, non-flammable gas |
Hazard Class: |
2.2 |
UN Number: |
UN 1982 |
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Xenon, Xe » |
Krypton, Kr » |
Neon, Ne » |
Helium, He » |
Argon, Ar » |
Lasergas, XeNe » |
Lasergas, KrNe » |
Lasergas, ArXeNe » |
Lasergas, NeH2 » |
Octafluoropropane,
C3F8 » |
Octafluorocyclobutane,
C4F8 » |
Sulfur Hexafluoride,
SF6 » |
Silicon tetrafluoride,
SiF4 » |
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