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| Tetrafluoromethane CF4»
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TETRAFLUOROMETHANE
CF4 (R14 ) Gas Purity 99,999. |
| Name: |
Tetrafluoromethane |
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| Symbol: |
CF4 |
| Molecular Weight: |
88,01 g/mol |
| CAS Registry ID: |
75-73-0 |
| UN Number: |
UN 1982 |
CF4 mainly used for plasma etching
in various silicon films processes. Can be used alone or in combination
with oxygen. Lower grades of CF4 are also available.
Qualitative performance
| Halocarbon 14 |
CF4 |
% |
99,999 |
| Nitrogen |
N2 |
ppm |
8,0 |
| Oxygen |
O2 |
ppm |
2,0 |
| Halocarbon 116 |
C2F6 |
ppm |
1,0 |
| Carbon oxides |
CO+CO2 |
ppm |
0,5 |
| Sulfur hexafluoride |
SF6 |
ppm |
0,5 |
| Moisture |
H2O |
ppm |
1,0 |
| Acidity as HF |
|
wppm |
0,1 |
Information about cylinders
| Type of a cylinder |
Bulk, litreses |
Type of a valvees |
Operating pressurees, bar |
Net weightes, kg |
| B40 |
40 |
DIN 477/6 |
22 |
42 |
| B50 |
50 |
DIN 477/6 |
22 |
50 |
Transport data
| Chemical Symbol: |
CF4 |
| CAS Registry ID: |
75-73-0 |
| Physical properties: |
A colorless, non-toxic, non-flammable gas |
| Hazard Class: |
2.2 |
| UN Number: |
UN 1982 |
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| Xenon, Xe » |
| Krypton, Kr » |
| Neon, Ne » |
| Helium, He » |
| Argon, Ar » |
| Lasergas, XeNe » |
| Lasergas, KrNe » |
| Lasergas, ArXeNe » |
| Lasergas, NeH2 » |
| Octafluoropropane,
C3F8 » |
| Octafluorocyclobutane,
C4F8 » |
| Sulfur Hexafluoride,
SF6 » |
| Silicon tetrafluoride,
SiF4 » |
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