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| Silicon tetrafluoride, SiF4
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| SILICON TETRAFLUORIDE (SiF4) |
| Name: |
Silicon tetrafluoride |
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| Symbol: |
SiF4 |
| CAS Registry ID: |
7783-61-1 |
| UN Number: |
UN 1859 |
SiF4 is used for plasma etching of
metal silicides, silicon films and in fiber-optic cables fabrication.
Silicon tetrafluoride is also used in semiconductor manufacturing.
Qualitative performance
| Silicon tetrafluoride |
SiF4 |
% |
99,99 |
| Hydrogen Fluoride |
HF |
vppm |
50,0 |
| Nitrogen |
N2 |
vppm |
3,0 |
| Oxygen |
O2 |
vppm |
1,0 |
| Carbon dioxide |
CO2 |
vppm |
1,0 |
| Carbon oxide |
CO |
vppm |
0,5 |
| Methane |
CH4 |
vppm |
10 |
| Arsenic |
As |
wppm |
0,5 |
| Phosphorus |
P |
wppm |
0,5 |
| Boron |
B |
wppm |
0,5 |
Information about cylinders
| Type of a cylinder |
Bulk, ltr. |
Type of a valves |
Operating pressures, bar |
Net weight, kg |
| B40 |
40 |
DIN 477/6 |
22 |
42 |
| B50 |
50 |
DIN 477/6 |
22 |
50 |
Transport data
| Chemical Symbol: |
SiF4 |
| CAS Registry ID: |
07783-61-1 |
| Physical properties: |
Colorless, poisonous, corrosive gas |
| Hazard Class: |
2.3 (poison gas) |
| UN Number: |
UN 1859 |
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| Xenon, Xe » |
| Krypton, Kr » |
| Neon, Ne » |
| Helium, He » |
| Argon, Ar » |
| Lasergas, XeNe » |
| Lasergas, KrNe » |
| Lasergas, ArXeNe » |
| Lasergas, NeH2 » |
| Tetrafluoromethane,
CF4 » |
| Octafluorocyclobutane,
C4F8 » |
| Sulfur Hexafluoride,
SF6 » |
| Octafluoropropane,
C3F8 » |
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