Silicon tetrafluoride, SiF4
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SILICON TETRAFLUORIDE (SiF4 )
Name:
Silicon tetrafluoride
Symbol:
SiF4
CAS Registry ID:
7783-61-1
UN Number:
UN 1859
SiF4 is used for plasma etching of
metal silicides, silicon films and in fiber-optic cables fabrication.
Silicon tetrafluoride is also used in semiconductor manufacturing.
Qualitative performance
Silicon tetrafluoride SiF4 % 99,99
Hydrogen Fluoride
HF
vppm
50,0
Nitrogen
N2
vppm
3,0
Oxygen
O2
vppm
1,0
Carbon dioxide
CO2
vppm
1,0
Carbon oxide
CO
vppm
0,5
Methane
CH4
vppm
10
Arsenic
As
wppm
0,5
Phosphorus
P
wppm
0,5
Boron
B
wppm
0,5
Information about cylinders
Type of a cylinder
Bulk, ltr.
Type of a valves
Operating pressures, bar
Net weight, kg
B40
40
DIN 477/6
22
42
B50
50
DIN 477/6
22
50
Transport data
Chemical Symbol:
SiF4
CAS Registry ID:
07783-61-1
Physical properties:
Colorless, poisonous, corrosive gas
Hazard Class:
2.3 (poison gas)
UN Number:
UN 1859
Xenon, Xe »
Krypton, Kr »
Neon, Ne »
Helium, He »
Argon, Ar »
Tetrafluoromethane,
CF4 »
Octafluorocyclobutane,
C4 F8 »
Sulfur Hexafluoride,
SF6 »
Octafluoropropane,
C3 F8 »
Propen(Propylen),
C3 H6 »
Propan, C3 H8
»
Butan »
Lasergases »
